Google Answers: Tungsten Silicide etch in SC1 chemistry

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Q: Tungsten Silicide etch in SC1 chemistry ( No Answer, 0 Comments )

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Subject: Tungsten Silicide etch in SC1 chemistry
Category: Science > Technology
Asked by: sdasam-ga
List Price: $30.00

Posted: 27 Aug 2004 13:49 PDT
Expires: 02 Sep 2004 15:01 PDT
Question ID: 393547

Tungsten Silicide is used in GC stack structure in chip manufacturing.
The next step, after the plasma etching of GC stack is wet cleaning? I
want to know (research or published papers) the chemistries used for
the cleaning and also challenges at this step.

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