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Subject:
PVD(Physical Vapor Oeposition) particle source analysis
Category: Science > Technology Asked by: yang1111-ga List Price: $20.00 |
Posted:
02 Nov 2006 03:59 PST
Expires: 02 Dec 2006 03:59 PST Question ID: 779349 |
PVD(Physical Vapor Oeposition) particle source analysis.The PVD equipment is belong Endura two(Blue).I hope that it include external particle and internal particle sources |
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There is no answer at this time. |
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Subject:
Re: PVD(Physical Vapor Oeposition) particle source analysis
From: kewler-ga on 02 Nov 2006 07:42 PST |
Physical Vapor Deposition is a frequently used process in the fabrication of semiconductors. Endura is the name of a machine (which I have actually used) to deposit thin films on wafers. Built by Applied Materials, it is one of the best pieces of equipment for CVD/PVD of Ti/TiN - an electical "spiking" barrier that allows alumininum based films to be used as interconnections between devices on integrated circuits. If you are looking for particle analysis, many other inspection tools are used to determine size, count, grouping and overall maping of defects. KLA and Tencor come to mind as some of my personal favorites. Some of their newer tools actually do partical source analysis (REAL-TIME SINGLE PARTICLE MASS SPECTROMETRY) |
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