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Q: PVD(Physical Vapor Oeposition) particle source analysis ( No Answer,   1 Comment )
Subject: PVD(Physical Vapor Oeposition) particle source analysis
Category: Science > Technology
Asked by: yang1111-ga
List Price: $20.00
Posted: 02 Nov 2006 03:59 PST
Expires: 02 Dec 2006 03:59 PST
Question ID: 779349
PVD(Physical Vapor Oeposition) particle source analysis.The PVD
equipment is belong Endura two(Blue).I hope that it include external
particle and internal particle sources
There is no answer at this time.

Subject: Re: PVD(Physical Vapor Oeposition) particle source analysis
From: kewler-ga on 02 Nov 2006 07:42 PST
Physical Vapor Deposition is a frequently used process in the
fabrication of semiconductors.  Endura is the name of a machine (which
I have actually used) to deposit thin films on wafers.  Built by
Applied Materials, it is one of the best pieces of equipment for
CVD/PVD of Ti/TiN - an electical "spiking" barrier that allows
alumininum based films to be used as interconnections between devices
on integrated circuits.

If you are looking for particle analysis, many other inspection tools
are used to determine size, count, grouping and overall maping of
defects.  KLA and Tencor come to mind as some of my personal
favorites.  Some of their newer tools actually do partical source

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